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Be the leader of MPCVD equipment manufacturing in China
Performance
Product Advantages Overview
   A user-friendly interface with a full range of applications and protection measures to ensure a safe and efficient operation of the equipment;
   Precisely temperature-controlled water-cooled reaction chambers and automatically real-time adjustable growth substrates;
   High precision and integration level of the equipment, high space utilization;
   Optimized cavity and adapter design by means of field simulation, enhancing growth efficiencies;
   Imported microwave systems from Europe with high output energy density within which the plasma ball can maintain a high degree of stability;
   Flexible automatic/manual switching operation and extensive data logging capabilities;
   High-precision process-gas flow control enables longtime and stable operations;
   Upon the customer's needs, it is optionally available to monitor the temperature field within the reaction chamber with a thermal imaging camera, and to introduce AI monitoring and intervention of the growth process;
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